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Masking Rubber Sheet for Lead Frame Plating
Masking Rubber Sheet for Lead Frame Plating
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Wacom Manufacturing Co., Ltd.

We supply silicone rubber sheet of low hardness for masking for lead frame plating.
Hardness 0 ~20 degree Hs JIS A
Thickness 0.3 ~1.5 mm
Substrate PET film with adhesive tape
Bakelite, Others

Please inquire the specification of hardness, thickness and others.
For detail: PDF:Silicone_RubberMASK_eng.pdf

Atmospheric Pressure CVD(APCVD) System
APCVD System for Crystalline Solar Cell Production
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     AMAX1000S
    AMAYA CO., LTD.
Newly released APCVD System for Crystalline Solar Cell volume production to deposit nondoped SiO2 film for Hard Mask and Passivation or to deposit doped SiO2 film for solid diffusion source for high end crystalline solar cells.
Feature
  • Developed continuous APCVD system technologies and experience over 40 years at semiconductor wafer process to Crystalline Solar Cell production.
  • Higher Productivity □156mm Wafer >1300 pcs/hour, □125mm >2000pcs/hour
  • Application: Hard Mask, Solid Diffusion Source, Passivation
Continuous APCVD System
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       A6300
    Manufactured by
    AMAYA Co., Ltd.
Continuous APCVD system is traditionally for semiconductor and solar power cell process. AMAYA Co., Ltd provides APCVD System for SiH4 and TEOS Base NSG, PSG, BPSG film deposition in atmospheric pressure.
Feature
  • Use trays to transfer substrates.
  • SiC trays achieve lower metal contamination.
  • Higher throughput
  • Plasma damage free deposition
  • Many installation record worldwide
Lineup
  • A6300                  Small footprint and high throughput
  • AMAX Series     Deposit up to 300mm wafers.
  • ATO Series         Use TEOS for Deposition.
Single Wafer APCVD System
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       A200
   Manufactured by
   AMAYA Co., Ltd.
AMAYA provides single wafer APCVD system for SiH4 and TEOS base NSG, PSG, BPSG film deposition.
Feature
  • Face down method for better gap fill performance.
  • Reduce particles by N2 Purge function.
  • Plasma Damage Free design by APCVD system.
Lineup
  • A200Series 200mm and 300mm wafer deposition.
R&D CVD System
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      Type D301
   Manufactured by
   AMAYA Co., Ltd.
R&D CVD System is available by AMAYA Co., Ltd.
Feature

Customize configuration available for R&D and pilot production.

Lineup
  • D301 Single Wafer CVD system for multiple application.
  • D501 Multi Wafer SiH4O3 APCVD System
  • D601 Single Wafer APCVD system
Scale Removal System
Modulation Electromagnetic Processing Equipment (New Scale Watcher)
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This is a physical method water processing machine for elimination and prevention of scale. This machine was designed by uniting magnet (6000 gauss) and modulation electromagnetic field processing. Usually, static magnetic field has not been impressive in performance. By combining static magnetic field (magnet) and dynamic magnetic field (AC electromagnetic field), this machine takes advantage of both. Frequency is about 40,000Hz.
Characteristics
  • Possible to eliminate and prevent scales functions from outside of the pipe.
  • Not usable for corroded water.
  • Cost will be reduced by combining a sterilizer and an automatic blower.
  • Possible to reduce chemical solution. (cationic chemicals is usable together.)
  • Processing of 500cc sample water explains efficiency of this machine.
  • A monitor is attached for safe operation.
  • Effective to prevent high calcium scale
Applicable items
Machines to remove sulfur from exhaust smoke of hot spring water Prevention of scale of slaked lime
Desktop Water Analyzer
Portable Water Quality Analyzer HS-1000
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Compact body measures 98 (W) x 202 (D) x 15 (H) mm. Input of many software makes it possible to analyze lots of components. Use of a pre processing machine makes it possible to analyze phosphorus and nitrogen and COD.
Characteristics
  • Possible to measure residual chlorine (HS-1000CL)
  • Possible to measure COD (HS-1000COD)
  • Possible to measure CNP (HS-1000CNP)
  • Possible to make itemized measurement of subterranean water (HS-1000GW)
Microbubble Water Dissolution System
Microbubble Dissolution System * Patent Pending
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This is a unit to let microbubble dissolve into DI water and supply the microbubble water to the use point automatically and safely for better cleaning results.
Characteristics
  • Compact body of space-saving design
  • The unit consists of 1~4 or 8 chambers or tanks.
  • Microbubble water flow is 1~14LPM.  (To be discussed separately.)
  • The unit is automatically controlled following the signals.
  • Economy mode to save DI water while standing by (optional).
  • A leakage sensor is included in the standard specs.
  • The unit is usable for a batch cleaning machine. (circulation type)
  • The unit is usable for a single wafer cleaning machine (one pass type)
  • Possible to meet requirement of each cleaning machine manufacturer.
  • Diameter of a bubble is about *0μm.
  • A separate discussion will be held about dissolution of metal. (E-10)
  • DI water flow is about 14LPM max.
Oil Flock System
Oil Flock System (Cohesion & Separation System for waste water)
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Sample before and after
This is a newly developed waste water treatment system to discharge cohered oil by adding and mixing the special cohesive agent (oil flock) in the oil containing waste water pooled in a tank.
Characteristics
  • Customize our system according to each customer’s budget.
  • Just add the cohesive agent (oil flock) and press the button to start operation.
  • Both batch operation and continuous operation are available. The treatment capacity is from 100L/day to 10m/day.
  • The cost of cohesive agent is low and only a small amount is needed for operation. Running cost, therefore, is sizably low.
  • A timer is programmed for less workers and faster operation.
  • Filter bags can be replaced easily and safely at low cost.